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Equipments

TCAD.bmp 

  3D TCAD device & process simulation tool (SILVACO) & Server

(Worldwide industry used) Semiconductor device & process simulation

RedHat Enterprise 4(OS), Quadcore Xeon Pro X3220, 4GB memory

 PECVD.bmp

 Plasma Enhanced Chemical Vapor Deposition (PECVD)

6 inch substrate, 6 gas sources, Load-lock system

Dielectrics (SiO2, Si3N4), a-Si thin film, Si NW growth, mask layers, passivation,

장비 사용 신청서

ICP RIE.bmp

Inductive Coupled Plasma Reactive Ion Etcher (ICP-RIE)

High density plasma etcher. 6in substrate, Bosch process, 6 gas sources, Load-lock

Etch metal, dielectrics (SiO2, Si3N4, Al2O3), III-V materials, ashing, Si deep etch

 장비 사용 신청서

 

Atomic Layer Deposition (ALD)

High-K dielectrics (HfO2, ZrO2, Al2O3), TiN, TaN, Ru, Ir, ZnO etc.

 

               Four RF Sputter Systems (Thin film deposition tool)

  Many target materials including various metals, oxide materials, seminconductor, memory etc

SLS2.jpg

SLS (sequential lateral solidification) system

308 nm XeCl excimer laser (Lambda Physik Compex 205), 6 in wafer,

Laser Facility  

Measurement Equipments:

Keithley 4200 semiconductor parameter analyzer,  Keithley 4225 pulse generator, Keithley 2612A source meter,    

Keithley 237 high voltage source meter, HP4192 impedance analyzer, HP 34401A multimeter,   WBCS3000L

Triboelectric measurement, Keithley 486 picoammeter,     R8240 Electrometer, HP4145b semiconductor parameter analyzer etc.  

Animal rack for bio-implant in-vivo experiment

 

  Packaging

Furnace.bmp

Two furnaces (Max Temp: 1400 C)

 

RTA (rapid thermal annealing, Halogen lamp, 6 in wafer)

Ramp-up speed:50 C/sec, Max Temp: 1100 C. Vacuum (Ar, N2, O2 gas)

Ellipsometer.bmp

Ellipsometer (박막 두께 측정) 

UV ozone lamp.gif

Large area UV Ozone Lamp

(폴리머 표면처리 및 광학 반응)

E-beam evaporator

soft.bmp

Chemistry room

(spin-coater, microscope, measurement system)

photo.bmp

Mask Aligner (Clean room, 신소재과 공동장비)

 

Strong Collaboration with KAIST National Nanofab center

       Equipment List